Syllabus - Chemical Process Control (CM-604 (A))

Chemical Engineering

Chemical Process Control (CM-604 (A))

VI-Semester

Unit I

Construction and characteristics of final control elements such as Proportional, Integral, PD, PID controllers, pneumatic control valve, principles and construction of pneumatic and electronic controllers.

Unit II

Process instrumentation diagrams and symbols, process instrumentation for process equipments such as Distillation column Absorption column, Heat Exchanger, Reactors, Evaporators, fluid storage vessels.

Unit III

Laplace Transform, Linear open loop system, first order system and their transient response. Dynamic response of a pure capacitive process, Transportation lag, Dynamic response of a first order lag system.

Unit IV

Second order system and their transient response. Interacting and non-interacting system. Linear closed loop system, block diagram of closed loop transfer function, controllers, transient response of closed loop system.

Unit V

Stability concept, Routh stability criterion, relative stability, Hurwitz stability criterion, Nyquist’s stability criterion. Root locus technique, introduction to frequency response, Bode diagram, Bode stability criterion, gain and phase margins, Ziegler Nichols controller setting.

Course Objective

The objective of this course enables the students to know about control methods and make the students knowledgeable in various types of measuring instruments used in chemical process industries.

Practicals

Reference Books

  • Coughnower & Koppel – Process System Analysis and Control- McGraw Hill, New York.

  • D. P. Eckman – Automatics Process Control – McGraw Hill, New York.

  • Peter Harriot – Process Control – McGraw Hill, New York.

  • J. J. Nagrath & M. Gopal; Control System Engineering.